Artfil’s resist development policy
At Artfil, FLEX: Resist development that improves quality according to customer needs using resist that can be used in the current FPD photomask environment, and DSR: resist development that brings out the best performance of DSW.
![](https://artfil-inc.com/wp-content/uploads/2023/06/rejist2.png)
Ideal scenario and Reality of FPD Mask resist
![](https://artfil-inc.com/wp-content/uploads/2023/06/rejist3.png)
![](https://artfil-inc.com/wp-content/uploads/2023/04/rejist4.png)
新レジスト設計コンセプト
CD制御性向上(Range,MTM)
![](https://artfil-inc.com/wp-content/uploads/2023/04/rejist5.png)
Aiming to solve problems
Development of resist with「high sensitivityandhigh resolution」
TOP vew
![](https://artfil-inc.com/wp-content/uploads/2023/04/top.png)
Bird vew
![](https://artfil-inc.com/wp-content/uploads/2023/04/bird.png)
Side vew
![](https://artfil-inc.com/wp-content/uploads/2023/04/side.png)
Expected effect
![](https://artfil-inc.com/wp-content/uploads/2023/06/rejist11.png)
CD uniformity
![](https://artfil-inc.com/wp-content/uploads/2023/04/rejist6.png)
Dry etching 形状
断面形状
![](https://artfil-inc.com/wp-content/uploads/2023/04/rejist9.png)
Holo形状(0.8um)
![](https://artfil-inc.com/wp-content/uploads/2023/04/rejist10.png)