Artfil’s resist development policy
At Artfil, FLEX: Resist development that improves quality according to customer needs using resist that can be used in the current FPD photomask environment, and DSR: resist development that brings out the best performance of DSW.
Ideal scenario and Reality of FPD Mask resist
Aiming to solve problems
Development of resist with「high sensitivityandhigh resolution」
Dry etching 形状