Artfil’s resist development policy
At Artfil, FLEX: Resist development that improves quality according to customer needs using resist that can be used in the current FPD photomask environment, and DSR: resist development that brings out the best performance of DSW.
Ideal scenario and Reality of FPD Mask resist
新レジスト設計コンセプト
CD制御性向上(Range,MTM)
Aiming to solve problems
Development of resist with「high sensitivityandhigh resolution」
TOP vew
Bird vew
Side vew
Expected effect
CD uniformity
Dry etching 形状
断面形状
Holo形状(0.8um)
Other products we handle
